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Comparison ledger

Precision Implant xR 200 S High Currentversus160 XP Ion

Applied Materials Precision Implant xR 200 S High Current, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials xR 200 SVarian 160 XP Ion
Specifications
ConfigurationChamber with Liners Turbo Pump (2)[1]150mm High Current IMP[3]
OEMApplied Materials[1]Varian[4]
ModelPrecision Implant xR 200 S[1]160 XP Ion[4]
CategoryIon Implantation[2]Ion Implantation[3]
TypeHigh Current Ion Implanter[2]—
Wafer size8 inch[1]—
Vacuum & pumpingChamber with Liners Turbo Pump (2); Leybold Turbo Mech Parts; 8500 Cryo Pump (2); Backing Pumps (3); Cryo Pumps (2); Cryo Compressor Energy Range Acceleration Drift / Accel[2]—
Tool type—ion implanter[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing