Waferpedia

Comparison ledger

EHP 500versusViision 200

Applied Materials EHP 500, Varian Viision 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

LinkedIn X Email
Documented as functional equivalents— Same function class: Ion Implantation, null[1]
Side-by-side comparison of selected equipment models
Attribute
EHP 500Applied Materials
Viision 200Varian
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run—1996–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials EHP 500Varian Viision 200
Cited variants—
  • Viision 200, 8" - Medium Current[2]
  • Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2000 Vintage[3]
  • Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2013 Vintage[4]
  • VIISion 80LE[5]
  • VIISion 200 PLUS2[5]
  • Viision 200 (Medium Current)[2]
  • VIISion 200 PLUS[5]
Specifications
ConfigurationMedium Current[1]Medium Current[2]
Wafer Size6 inch[1]—
TypeMedium Current Implanter[1]—
Phase—3 Phase[3]
Wafer size—8 inch (200 mm)[2]
Process type—Batch[5]
Current type—High Current[5]
Energy range (VIISion 200 PLUS2)—Up to 200 keV[5]
Energy range (VIISion 80LE)—250 eV to 80 keV[5]
Electrical requirements—3 Phase, 5 Wire, 208 V, 50/60 Hz[3]
Voltage—208 Volt[3]
Frequency—50/60 Hz[3]
Vintage—2000[3]
Uptime—over 85%[5]
Equipment type—Ion implanter[2]
Model—Viision 200[2]
Current class—High current[5]
EHP 500 entryViision 200 entryAsk about these tools →Share experience with this comparison →

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]web.archive.orgweb.archive.org