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Comparison ledger

0041-39086 ESC PartversusRF 350

Applied Materials 0041-39086 ESC Part, Veeco RF 350, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
RF 350Veeco
OEMApplied MaterialsVeeco
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Veeco RF 350
Specifications
Configuration—Missing Parts[1]
Category—Etch[2]
Tool type—Ion Beam Etcher (IBE)[2]
Process modes—Ion Beam Etching (IBE) and Reactive Ion Beam Etching (RIBE)[2]
Ion source type—inductively coupled, filamentless RF ion source[2]
Ion source diameter—300 mm[2]
Substrate loading—single-substrate loadlocked (or configurable to cassette-to-cassette)[2]
Wafer size—single 6" (150 mm)[2]
Loading—single 6" wafer loading[2]
Applications—MEMS, semiconductor fabrication, and data storage[2]
Missing parts—Missing parts[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com