Waferpedia

Comparison ledger

0041-39086 ESC PartversusShuttleline ICP

Applied Materials 0041-39086 ESC Part, Plasma-Therm Shuttleline ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Shuttleline ICPPlasma-Therm
OEMApplied MaterialsPlasma-Therm
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Plasma-Therm Shuttleline ICP
Specifications
Configuration—Etched III-V materials[1]
Wafer Size—6 inch[1]
Etched Materials—III-V materials[1]
External pumps and chiller—Not included[1]
Tool type—Inductively coupled plasma etcher[1]
Process material—III-V materials[1]
Vacuum & pumping—External pumps and chiller not included[2]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com