Waferpedia

Comparison ledger

0041-39086 ESC PartversusPlasmalab 800 Plus RIE

Applied Materials 0041-39086 ESC Part, Oxford Instruments Plasmalab 800 Plus RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Plasmalab 800 Plus RIEOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Oxford Instruments Plasmalab 800
Specifications
Configuration—LEP Tungsten[1]
Type—Reactive Ion Etching (RIE) System[2]
Controller—PC controller[3]
Footprint design—All electronics and vacuum components located within the tool body to minimize footprint[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]semistarcorp.comsemistarcorp.com