Waferpedia

Comparison ledger

0041-39086 ESC Partversus9400

Applied Materials 0041-39086 ESC Part, Lam Research 9400, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
9400Lam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Lam Research 9400
Specifications
OEM—Lam Research[1]
Model—TCP 9400[1]
Tool name—Lam Research TCP 9400 Poly Etcher[1]
Process category—Inductively Coupled Plasma Etching (ICP)[1]
Cleanliness group—Clean, Semiclean[1]
Use—for poly and Si etches[1]
Maximum etch depth—3 um[1]
Process materials—Poly and Si[1]
Cleanliness—Clean, Semiclean[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]snfguide.stanford.edusnfguide.stanford.edu