Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Zeiss NVision 40, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | NVision 40Zeiss |
|---|---|---|
| OEM | Applied Materials | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Zeiss NVision 40 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | NVision 40[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | 208-230 V[3] |
| Manufacturer | — | Zeiss[3] |
| Electron microscope type | — | SEM-FIB[4] |
| SEM column | — | Schottky field emission Gemini column[5] |
| SEM operating voltage | — | 100 V to 30 kV[5] |
| SEM resolution | — | 1.1 nm at 20 kV; 2.5 nm at 1 kV[5] |
| FIB column | — | SIINT Zeta Ga+ ion FIB column[5] |
| FIB operating voltage | — | 1 kV to 30 kV[5] |
| FIB ion current | — | 0.1 pA to 45 nA[5] |
| Ion beam resolution | — | 4 nm at 1 pA[5] |
| Power | — | 208-230 V[3] |
| Frequency | — | 50-60 Hz[3] |
| Gas delivery | — | Has W, C SiO2 and H20 gases installed[6] |
| Micromanipulator | — | With kleindiek mm3a micromanipulator[3] |
| XeF2 | — | Option, not installed[3] |
| Controller status | — | One of the controllers on the two turbo pumps is not operational[6] |
| Detectors | — | Everhart-Thornley detector, 4 quadrant backscatter, in-lens secondary electron detector, energy selective backscatter detector[5] |
| Lithography system | — | Raith Elphy Quantum lithography system[5] |
| Nanoscale lithography | — | NanoPattern Generating System (NPGS)[7] |