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0010-22161 High EFF RF Matchversus8836 HPO Photoresist

Applied Materials 0010-22161 High EFF RF Match, SVG 8836 HPO Photoresist, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsSVG
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchSVG 8836 HPO Photoresist
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Wafer sizes—6 inch, 8 inch[3]
Process steps—Coating: Send-Prime-Chill-Coat-Bake-Receive; Developing: Send-Bake-Chill-Develop-Bake-Receive[4]
Series—8800 series[4]
Configuration—Dual track[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]semistarcorp.comsemistarcorp.com