Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, MKS 627H, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 627HMKS |
|---|---|---|
| OEM | Applied Materials | MKS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | MKS 627H |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Full Scale range | — | 0.02 to 25,000 Torr[3] |
| Accuracy | — | 0.12% or 0.15% of reading[3] |
| Overpressure limit | — | 45 psia (310 kPa) or 120% of full scale, whichever is greater[3] |
| Temperature control | — | 45°C[3] |