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0010-22161 High EFF RF MatchversusRS 55 Auto Resistivity Mapper

Applied Materials 0010-22161 High EFF RF Match, KLA RS 55 Auto Resistivity Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsKLA
Category——
Wafer size——
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FamilyApplied Materials 0010-22161 High EFF RF MatchKLA RS 55 Auto Resistivity Mapper
Cited variants—
Specifications
MakeApplied Materials[2]—
Model0010-22161[2]RS 55 Auto[5]
DescriptionHTESC PH 1 REV A[3]—
ConditionUsed[3]—
Stock NumberBM6628[3]—
Equipment type—Four-point probe resistivity mapping system[1]
Configuration—RS55/TC temperature compensation configuration[1]
Wafer size—Up to 8"/200 mm wafers[1]
Wafer handling—Manual wafer handling[1]
Measurement outputs—Contour maps, 3-D plots and diameter scans[1]
Temperature compensation—Can compensate sheet resistance measurements against ambient temperature and materials[1]
Power—115V, 50/60 Hz[1]
Measurement capability—Surface resistivity measurement[4]
Software—Omni-Map Rev. 6.51 software with StatTrax[4]
Sample size—8"-wafer or below[4]
Data storage—2 GB Iomega Drive extra data storage[4]
Calibrated range—0.005 Ω to 5 MΩ, NIST traceable[4]
Probe head—One probe head with desired range included[4]
Type—Four-point probe resistivity mapping system[1]
Outputs—Contour maps, 3-D plots, and diameter scans[1]
Measurement compensation—Can compensate sheet resistance measurements against ambient temperature and materials[1]
Measurement range—Calibrated (and NIST traceable) range from 0.005Ω to 5MΩ[4]
System type—Four-point-probe resistivity mapping system[1]
Measurement—Surface resistivity measurement[4]
Probe heads—One probe head with desired range included[4]
Sources (5)Every fact above is drawn from these public sources
  1. [1]tech-semi.comtech-semi.com
  2. [2]Equipment inventory listing
  3. [3]tarasemi.comtarasemi.com
  4. [4]gsemi.comgsemi.com
  5. [5]Equipment inventory listing