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0010-22161 High EFF RF MatchversusM Gage 300 Film Thickness

Applied Materials 0010-22161 High EFF RF Match, KLA M Gage 300 Film Thickness, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
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FamilyApplied Materials 0010-22161 High EFF RF MatchKLA M Gage 300 Film Thickness
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Measurement principle—Non-contact Eddy Current measurement[3]
Sheet resistance range—1 ohm/sq to 1,999 ohm/sq; 1 mOhm/sq to 1,999 mOhm/sq[3]
Film thickness range—100 Angstroms min to 270K Angstroms (calculated by DDC when resistivity is 2.7 uOhm-cm)[3]
Substrate diameter—2”, 3”,4”,5”,6” standard wafers; 150mm (6”) wafers[4]
Substrate thickness—200mm to 1000mm[4]
Repeatability—Total repeatability is the standard deviation percent of mean value, +/-1 count: 1 to 100 mOhm/sq and Ohm/sq: 1.0%; 100 to 500: 2.0%; 500 to 1,000: 4.0%; 1,000 to 1,999: 6.0%[4]
Display—3 ½ Digit LED display, autoranges over three decades[3]
Measurement modes—Manual and Automatic modes; 5-point and 9-point multi-point measurements supported[4]
Units of measurement—Ohms per square or milliohms per square, switch selectable[3]
Resistivity range—0.05 mOhm-cm to 100 mOhm-cm or 0.05 Ohm-cm to 100 Ohm-cm (for a 500 micrometer wafer)[4]
Power requirements—110Vac, 50-60Hz, <15A[3]
Dimensions—Tester: 24cm (9.5”)W x 19cm (7”)H x 39cm (15.5”)D[3]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]semistarcorp.comsemistarcorp.com