Comparison ledger
Applied Materials 0010-21246 Part, Onto Innovation Nanospec 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-21246 PartApplied Materials | Nanospec 3000Onto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Onto Innovation Nanospec 3000 |
| Specifications | ||
| Wavelength range | — | 480-800 nm[1] |
| Wavelength range (alternative) | — | 400-800 nm[2] |
| Film thickness range | — | 250 A to 35 µm[1] |
| Film thickness range (alternative) | — | 100A up to 20um (resolution 50A)[2] |
| Maximum film thickness | — | 30µm[2] |
| Measurement spot size | — | 25 µm[1] |
| Measurement spot size (alternative) | — | 25um, down to 100nm at 40X objective[2] |
| Measurement time | — | 0.25 s to 4 s / site[1] |
| Measurement time (alternative) | — | less than 3 seconds[2] |
| Number of layers | — | 3[1] |
| Number of layers (alternative) | — | up to 3 films[2] |
| Detector | — | Linear diode array detector[1] |
| Reproducibility | — | <2 A[1] |
| Wafer size | — | 3"-6"[1] |
| Wafer size (alternative) | — | up to 6"/150mm[2] |
| Objective magnifications | — | 5X, 10X (default), 50X[3] |
| Spot size per objective | — | 5X: 50 µm; 10X: 25 µm; 50X: 5 µm[3] |