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Comparison ledger

0010-16392 ESC AssemblyversusSLR 770 ICP Deep Silicon

Applied Materials 0010-16392 ESC Assembly, Plasma-Therm SLR 770 ICP Deep Silicon, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
OEMApplied MaterialsPlasma-Therm
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyPlasma-Therm SLR 770
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]SLR 770[3]
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Configuration—Load lock shuttle lock transfer[3]
Process Gas—O2, Ar, SF6, C4F6[3]
Chiller—Neslab HX300[3]
Power Box—Square D[3]
Manufacturer—Plasma-Therm[3]
Category—Etch[3]
Wafer sizes—4 inch[3]
Tool type—Single-chamber inductively coupled plasma etcher[4]
Wafer handling—Load lock shuttle lock transfer[3]
Load lock—Single wafer semi-auto load lock[5]
Application—Deep silicon etch[5]
Gas box—Horiba SEC-E40 (4)[3]
Process gases—O2, Ar, SF6, C4F6[3]
Controller and RF generator—RF Power Products RFPP I22050001 & I20050007[3]
Adaptive pressure controller—VAT PM-5[3]
Heater controller—Plasmatherm PC OS[3]
RF generator—RF Power Products RFPP RF5S & AM-5[3]
Turbo pump and controller—Leybold MAG 2000; Leybold MD 2000[3]
Vintage—01.06.1998[5]
Power—1.0 kW ICP RF package; 2 kW generator limited to 1.0 kW; 500 W RF bias[5]
Gas box lines—5 lines[5]
Additional process gases—CHF3, C4F8, SF6, Ar, O2[5]
Dry pump—Edwards ih80[5]
Load lock dry pump—Edwards nxds[5]
Load lock turbo pump—Leybold[5]
Turbo pump—Edwards STPA-1303CV[5]
Electrical—380VAC 3 phase[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]fabsurplus.comfabsurplus.com