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0010-16392 ESC AssemblyversusAlcatel Adixen AMS 200 DRIE

Applied Materials 0010-16392 ESC Assembly, Pfeiffer Alcatel Adixen AMS 200 DRIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
OEMApplied MaterialsPfeiffer
CategoryEtchEtch
Wafer size—Single-Wafer Chamber for Deep Silicon Etch
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyPfeiffer Alcatel Adixen AMS 200 DRIE
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]—
TypeESC Assembly[1]—
Wafer Size300 mm[2]8 inch[3]
Electrode ConfigurationDual[2]—
Power—400 V, 50/60 Hz, 3-Phase[3]
Electrical Feed—480 VAC to Tool[3]
Tool Supply—208 V, 500 A, 3-Phase, 4-Wire[3]
Wafer size—Single-Wafer Chamber for Deep Silicon Etch[3]
Process Gases—Ar, O2, N2, C4F8, SF6 & He[3]
RF Power—5 kW[3]
Platen Power—3 kW[3]
Cooling—Standalone Chiller[3]
Cryogenic Cooling—No[3]
Turbo Pump—Removed / Not Included[3]
Roughing Pump—Removed / Not Included[3]
Trap—Removed[3]
Foreline—Removed[3]
Auto Load/Unload—Yes[3]
Robot—1 Robot from cassette to chamber[3]
Chamber Type—Single-Wafer Chamber[3]
Process Type—Deep Silicon Etch (DRIE)[3]
Vacuum & Air Utilities—Yes[3]
Additional Spares—Yes[3]
Spare Trap—Available[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing