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Comparison ledger

0010-14300 Magnet AssyversusE 500 EHPI Medium Current

Applied Materials 0010-14300 Magnet Assy, Applied Materials E 500 EHPI Medium Current, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
E 500 EHPI Medium CurrentApplied Materials
OEMApplied MaterialsApplied Materials
CategoryIon ImplantationIon Implantation
Wafer size—Wafer Position Detect
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyApplied Materials E 500
Specifications
ConfigurationP4 Magnet Assy, IMP[1]CE Mark[3]
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Loading Configuration—Open Cassette[2]
Software—V 13.30 rev D[3]
Floppy Drive Type—3.5"[3]
Energy Range—10 KeV - 200 KeV[2]
Solid State Scanner—30 KV[3]
Gas Box Type—HP[2]
Computer Type—Pentium[3]
OEM—Applied Materials / Varian[3]
Model—E 500 EHPI[2]
Category—Ion Implantation[2]
Wafer Sizes—6 inch[3]
Load Lock Turbo—V 300 HT[3]
Source Zone Turbo Pump—STP 1000[3]
Scanner Turbo Pump—STP 1000[3]
Analyzer Turbo Pump—V 300 HT[3]
Vacuum Pumps (3)—Edwards QDP 80, QMB 250[3]
Pump Type—Dry[3]
Wafer size—Wafer Position Detect[3]
Wafer size / detect—Wafer Position Detect[2]
Scanner—Solid State Scanner, 30 KV[3]
Control interface—GEM/SECS; SECS II Interface[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing