Comparison ledger
Applied Materials 0010-13622 RF Match for, Ulvac Ei 7 L E-Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Ei 7 L E-BeamUlvac |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | Deposition | Deposition |
| Wafer size | — | Auto loader (EFEM), wafer transfer system, load lock chamber, process chamber, operation panel. |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Ulvac Ei 7 L E-Beam |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Exhaust System:[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Wafer size | — | Auto loader (EFEM), wafer transfer system, load lock chamber, process chamber, operation panel.[2] |
| Evaporation Source | — | EGN-4020 (40 ml x 20 pockets)[2] |
| EB Power Supply | — | 10 kw[2] |
| Internal jig | — | Rotation type[2] |
| Substrate holder | — | 6 inch dia x 25 pcs[2] |
| Substrate heating | — | infrared heater unit (750W x 2), 200* C normal, 300* C max[2] |
| Deposition materials | — | Metals (Al, Ni, Ti, Pt, Au, etc.)[2] |
| Dry Pump | — | PS1802-AN_200V_60Hz[2] |
| Cryo Pump | — | CRYO-U20P[2] |
| Vintage | — | 2015[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →