Comparison ledger
Applied Materials 0010-13622 RF Match for, Denton Vacuum Desk II, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Desk IIDenton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Denton Vacuum Desk |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Metal[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Weight | — | 103 lbs[3] |
| Dimensions | — | 21 x 21 x 24 inches[3] |
| Electrical | — | 115V/220V 50/60 Hz[3] |
| Argon gas requirement | — | 5 psig, 99.99% purity[3] |
| Turbomolecular pump speed | — | 100 lps[3] |
| Ultimate vacuum | — | 10-6 Torr[3] |
| Mechanical pump speed | — | 60 lpm[3] |
| Chamber diameter | — | 6 inches[3] |
| Wafer size | — | 8 inch[2] |
| Available targets | — | Gold, Gold/Palladium (60:40), Chromium[4] |
| Carbon evaporation accessory | — | Available[4] |
| Cycle time | — | Less than 5 minutes[3] |
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