Comparison ledger
Applied Materials 0010-03485 Magnet Assy, KLA RS 100 Sheet Resistance Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | KLA RS 100 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Refurbished[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | RS 100[6] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Make | — | KLA[6] |
| Equipment name | — | KLA RS 100 Sheet Resistance Measurement System[6] |
| Wafer sizes | — | 4 inch, 6 inch, 8 inch, 12 inch[5] |
| 300 mm wafer manufacturing | — | Designed to meet production requirements for 300 mm wafer manufacturing[7] |
| Temperature compensation | — | Film-specific TCR correction for temperature variations during wafer measurement[7] |
| Edge performance | — | Measurement information up to 1 mm from the conductive film edge[7] |
| Control software | — | Windows NT[7] |