Comparison ledger
Applied Materials 0010-03485 Magnet Assy, KLA F 50 Thin Film Thickness Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | KLA F |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | Model 205-0881[1] |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | F 50[6] |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | KLA / Filmetrics[6] |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Software version | — | 9.6.9.0[1] |
| Beginning / Ending nm | — | 378.90 / 1050.80[1] |
| Integration Time at 3000 Counts on | — | Si 3.1 ms[1] |
| Sub-model | — | 205-0881[1] |
| Spectral Range Start | — | 378.90 nm[1] |
| Spectral Range End | — | 1050.80 nm[1] |
| Integration Time | — | 3.1 ms at 3000 counts on Si[1] |
| Model number variant | — | 205-0881[1] |
| Spectral range (beginning nm) | — | 378.90[1] |
| Spectral range (ending nm) | — | 1050.80[1] |
| Integration time at 3000 counts on Si | — | 3.1 ms[1] |
| OEM / Make | — | KLA / Filmetrics[1] |
| Product Type | — | Thin Film Thickness Mapper[1] |
| Listed Model Designation | — | 205-0881[1] |
| Wavelength Range | — | 378.90 to 1050.80 nm[1] |
| Model designation | — | 205-0881[1] |
| Wavelength range | — | 378.90 nm - 1050.80 nm[1] |