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Comparison ledger

0010-03485 Magnet AssyversusIXL 120

Applied Materials 0010-03485 Magnet Assy, Edwards IXL 120, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
IXL 120Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards IXL 120
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Type—Dry pump[6]
Pumping speed (CFM)—65 CFM[6]
Pumping speed (m³/hr)—120 m³/hr[1]
Ultimate pressure—0.01 mbar (0.01 Torr)[1]
Inlet—ISO63 vertical[6]
Exhaust—KF25[6]
Weight—130 lbs[6]
Enclosure protection—IP31D[1]
Cooling water typical flow—4 slm at 3.0 bar[1]
Cooling water minimum purity—ISO 8573 solids class 1[1]
Sources (6)Every fact above is drawn from these public sources
  1. [1]manualslib.commanualslib.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]provac.comprovac.com