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Comparison ledger

0010-03254 E ChuckversusSurfscan 6200

Applied Materials 0010-03254 E Chuck, KLA Surfscan 6200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsKLA
Category——
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Family—KLA Surfscan 6200
Specifications
Wafer Sizes Supported—50mm (2"), 76mm (3"), 100mm (4"), 125mm (5"), 150mm (6"), 200mm (8")[1]
Defect Sensitivity—0.10 µm diameter PSL sphere equivalent with greater than 90% capture rate[1]
Defect Sensitivity (alternative)—0.12 µm[2]
Illumination Source—30 mW Argon-Ion laser, 488 nm wavelength[1]
Haze Sensitivity—0.02 ppm[1]
Haze Resolution—0.002 ppm[1]
Repeatability—0.5% at 1σ (mean count >500, 0.364 µm latex spheres)[1]
Accuracy—≥99% (verified with VLSI Standards)[1]
Dynamic Range—0.01 µm to 9,999 µm in a single measurement[1]
Throughput—Up to 100 w/hr using 150mm wafers[1]
Cassette Handling—Single puck wafer handling from two cassette (one sender/receiver, one receiver)[1]
Operating System / Software—Microsoft Windows 98, version 4.2[2]
Dimensions (H x W x D)—168 cm x 75 cm x 77 cm (66" x 29.5" x 30.25")[1]
Weight—240 kg (530 lbs)[1]
Sources (2)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]classoneequipment.comclassoneequipment.com