Comparison ledger
Agilent G 1888 Network Headspace Sampler, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent G 1888 Network Headspace Sampler | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Manufacturer | Agilent Technologies[1] | Applied Materials[5] |
| Model | G1888[1] | 0010-03485[5] |
| Sampling method | Static headspace sampling[2] | — |
| Technique | Automated headspace sampling for gas chromatography[2] | — |
| Injection type | Heated transfer line to GC inlet[2] | — |
| Operation | Fully automated vial heating, equilibration, pressurization, and injection[2] | — |
| Vial capacity | 70-sample tray, 12 oven positions[3] | — |
| Oven range | 40 to 230°C[3] | — |
| Oven temperature range | Ambient to ~200 °C[2] | — |
| Sample loop | 1 mL standard, 3 mL optional[3] | — |
| Transfer line | 85 cm[3] | — |
| Extraction modes | Single, multi-puncture (to 100), concentration mode[3] | — |
| Vial sizes supported | Commonly 10 mL and 20 mL headspace vials[2] | — |
| Carrier / pressurization gas | Helium, nitrogen, or other GC-compatible gases[2] | — |
| Control | Integrated with Agilent GC electronic pneumatic control (EPC)[2] | — |
| Sample pathway | Inert sample pathway with deactivated sample path from needle to transfer line[3] | — |
| Network control | Controlled over a network by GC ChemStation, MSD Productivity ChemStation, MSD Security ChemStation, or Cerity NDS[3] | — |
| Keypad | Built-in keypad runs the sampler standalone[3] | — |
| Event log | Tracks every operation and flags temperature or pressure deviation from setpoint, in line with 21 CFR Part 11[3] | — |
| GC compatibility | Agilent GC and GC-MS platforms (commonly 6890/7890 series)[2] | — |
| Detectors | FID, MS, ECD (method-dependent)[2] | — |
| Headspace Sampler to GC connection | Supports EPC and MPC configurations; EPC using 6850 and 6890 GCs; EPC using 7890 GC; MPC connections[4] | — |
| Carrier gas connections | Carrier and pressurization gas supplies; common carrier gas connections; vial pressurization gas connection; headspace sampler vent connection[4] | — |
| Configuration | — | WP AL 300mm PVD[5] |
| OEM | — | Applied Materials[5] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[6] |
| Process | — | PVD[7] |
| Wafer size | — | 300mm[8] |
| Version | — | Spares[8] |
| Part Number | — | 0010-03485[5] |
| Process Type | — | PVD (Physical Vapor Deposition)[5] |
| Application (Material) | — | Aluminum (AL)[5] |
| Wafer Diameter (associated) | — | 300 mm[5] |