Comparison ledger
Agilent 11980 A, Perkin Elmer Lambda 750 Spectrophotometer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | Lambda 750 SpectrophotometerPerkin Elmer |
|---|---|---|
| OEM | Agilent | Perkin Elmer |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Perkin Elmer Lambda 750 |
| Cited variants | — |
|
| Specifications | ||
| Wavelength Range | 1250-1600 nm[2] | 190 nm - 3300 nm[4] |
| Operating System | — | Win7 Professional N[3] |
| Configuration | — | UV-VIS + NIR[3] |
| Principle | — | Double beam, double monochromator, ratio recording UV/Vis/NIR spectrophotometer with microcomputer electronics, controlled by a DELL PC or compatible personal computer.[4] |
| Optical System | — | All reflecting optical system (SiO2 coated) with holographic grating monochromator with 1440 Lines/mm UV/Vis blazed at 240 nm and 360 Lines/mm NIR blazed at 1100 nm, Littrow mounting, sample thickness compensated detector optics.[4] |
| Beam Splitting System | — | Chopper (46+ Hz, Cycle: Dark/Sample/Dark/Reference, Chopper Segment Signal Correction CSSC).[4] |
| Detector | — | Photomultiplier R955 for high energy in the whole UV/Vis wavelength range; Peltier cooled PbS detector for NIR.[4] |
| Source | — | Pre-aligned tungsten-halogen and deuterium.[4] |
| UV/Vis Resolution | — | ≤ 0.17 nm[4] |
| NIR Resolution | — | ≤ 0.20 nm[4] |
| Stray Light (at 200 nm, 12 g/L KCl USP/DAP method) | — | > 2 A ≤ 0.0001 %T[4] |
| Stray Light (at 220 nm, 10 g/L NaI ASTM method) | — | ≤ 0.0001 %T[4] |
| Wavelength Accuracy | — | ± 0.15 nm UV/Vis; ± 0.5 nm NIR[4] |
| Wavelength Reproducibility (UV/Vis, Deuterium Lamp Lines) | — | ≤ 0.1 nm[4] |
| Wavelength Reproducibility (NIR, Deuterium Lamp Lines) | — | ≤ 0.06 nm[4] |
| Photometric Accuracy (Double Aperture Method 1 A) | — | ± 0.0012 A[4] |
| Photometric Linearity (at 3.0 A, addition of filters UV/Vis at 546.1 nm, 2 nm Slit, 1-sec integration) | — | ± 0.020 A[4] |
| Photometric Range | — | 6 A (using reference-beam attenuation)[4] |
| Bandpass | — | 0.17 nm - 5.00 nm in 0.01 nm increments UV/Vis range; 0.20 nm - 20.00 nm in 0.04 nm increments NIR range[4] |
| Photometric Stability (after warm-up at 500 nm, 0 A, 2 nm Slit, 2-sec integration, Peak to Peak) | — | ≤ 0.0002 A/h[4] |
| Baseline Flatness (190 nm - 3100 nm, slit UV/Vis 2 nm, slit NIR Servo Mode) | — | ± 0.0015 A[4] |
| Photometric Noise RMS (0 A and 500 nm) | — | ≤ 0.00005 A[4] |
| Primary Sample Compartment (W x D x H) | — | 200 mm x 300 mm x 220 mm[4] |
| Secondary Sample Compartment (W x D x H) | — | 480 mm x 300 mm x 220 mm[4] |
| Instrument Dimensions (W x D x H) | — | 1020 mm x 740 mm x 300 mm[4] |
| Instrument Weight | — | ~ 77 kg[4] |
| Digital I/O | — | RS 232 C[4] |
| Light Beam (above base plate) | — | 90 mm; 120 mm beam separation; 3 mm - 12 mm beam height[4] |
| Power Requirements | — | 90 VAC - 250 VAC, 50/60 Hz; 400 VA[4] |
| Temperature Range | — | 10 °C - 35 °C[4] |
| Recommended Humidity | — | 10 - 70% relative humidity, non-condensing[4] |
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