Comparison ledger
Advanced Energy MDX-10K, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MDX-10KAdvanced Energy | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Advanced Energy | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Advanced Energy MDX-10K | Applied Materials 0010-03485 Magnet Assy |
| Cited variants | — | |
| Specifications | ||
| Part Number | 3152313-000AB[1] | 0010-03485[5] |
| Model Number | 2012-043-R[2] | — |
| Manufacturer | Advanced Energy[1] | Applied Materials[5] |
| Model | MDX-10K[1] | 0010-03485[5] |
| Description | RF GENERATOR[1] | MAGNET ASSY, WP AL 300MM PVD[6] |
| Version | Spares[1] | Spares[8] |
| Quantity | 1[1] | — |
| Sales Condition | as is where is[1] | — |
| Power | 10 kW[4] | — |
| Type | DC magnetron power supply[4] | — |
| Applications | thin film deposition and sputtering[4] | — |
| Output Power | 10 kW[4] | — |
| Regulation Modes | Power, Current, Voltage[4] | — |
| Regulation Accuracy | 0.25% in all modes[4] | — |
| Ripple | 1% RMS at 100 kHz[4] | — |
| Ignition Voltage | 1550 V[4] | — |
| Response Time | 5 µs to plasma load changes[4] | — |
| Ramp Timer | 0 to 99.0 minutes, programmable[4] | — |
| Run Timer | Continuous or 0 to 99.0 minutes, programmable[4] | — |
| Voltage Configuration Standard Z Taps | 500–600 V, 600–800 V, 800–1000 V[4] | — |
| Voltage Configuration Low Z Taps | 400–500 V, 500–640 V, 640–800 V[4] | — |
| Voltage Configuration High Z Taps | 600–775 V, 775–1000 V, 1000–1250 V[4] | — |
| Input Voltage | 208 V ± 10%, 380 V ± 10%, 415 V ± 10% (3-phase, 50/60 Hz)[4] | — |
| Input Current | 34 A[4] | — |
| Weight | 71 lb[4] | — |
| Cooling | Forced-air[4] | — |
| Standard Z Taps | 500–600 V, 600–800 V, 800–1000 V[4] | — |
| Low Z Taps | 400–500 V, 500–640 V, 640–800 V[4] | — |
| High Z Taps | 600–775 V, 775–1000 V, 1000–1250 V[4] | — |
| Height | 25 inches[4] | — |
| Operating Temperature | 0 to 45°C ambient[4] | — |
| Humidity | 92% relative humidity, non-condensing[4] | — |
| Control Interfaces | Front panel, user port (RS-232), analog remote control[4] | — |
| Analog Control Signals | 0–5 V for voltage, current, and power control[4] | — |
| Interlock Inputs | Vacuum, water, system[4] | — |
| Configuration | — | WP AL 300mm PVD[5] |
| OEM | — | Applied Materials[5] |
| Process | — | PVD[7] |
| Wafer size | — | 300mm[8] |
| Process Type | — | PVD (Physical Vapor Deposition)[5] |
| Application (Material) | — | Aluminum (AL)[5] |
| Wafer Diameter (associated) | — | 300 mm[5] |