Comparison ledger
Accretech , Tokyo Semitsu Kogaku (TSK) UF3000, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | , Tokyo Semitsu Kogaku (TSK) UF3000Accretech | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Accretech | Applied Materials |
| Category | — | — |
| Wafer size | Wafer Equipment | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Accretech , Tokyo Semitsu Kogaku (TSK) UF3000 | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Wafer size | Wafer Equipment[1] | 300mm[7] |
| Currently Configured for | 300mm[1] | — |
| With Chiller | SCU-600B[1] | — |
| Section 1 | Tool General Information[1] | — |
| Section 2 | Tool Specific Information[1] | — |
| Manufacturer | Accretech, Tokyo Semitsu Kogaku (TSK)[1] | Applied Materials[4] |
| Model | UF3000[1] | 0010-03485[4] |
| Category | Wafer Equipment[1] | — |
| Equipment type | Wafer Prober[1] | — |
| Tool status | In production[1] | — |
| Tool location | Cleanroom[1] | — |
| Chiller | SCU-600B[1] | — |
| Vendor tool serial number | F24006MZ[1] | — |
| Micron MISTI/LID number | FE3SKAA300(TMM)[1] | — |
| Year | 2004[2] | — |
| Quantity | 9[3] | — |
| Short description | Fully Automated Prober[3] | — |
| Version | 300 mm[3] | Spares[7] |
| Nickel chuck | 12 inch[3] | — |
| Front loading | 300 mm single FOUP loading[3] | — |
| Robot blade | Dual ceramic robot blade[3] | — |
| Software version | S5.0FC4[3] | — |
| Loader type | TSK[3] | — |
| Chuck temperature range | 30~150℃[3] | — |
| OCR camera type | Type6[3] | — |
| Auto card change | Yes[3] | — |
| Needle cleaning unit | 150 mm x 150 mm ceramics pad[3] | — |
| Manipulator | Hinge, MHF4000[3] | — |
| Test system interface | AL6050 & Focus3000[3] | — |
| Includes | Printer[3] | — |
| Configuration | — | WP AL 300mm PVD[4] |
| OEM | — | Applied Materials[4] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[5] |
| Process | — | PVD[6] |
| Part Number | — | 0010-03485[4] |
| Process Type | — | PVD (Physical Vapor Deposition)[4] |
| Application (Material) | — | Aluminum (AL)[4] |
| Wafer Diameter (associated) | — | 300 mm[4] |