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-407B-1-S-CES293 RobotversusDCS1440

ABM -407B-1-S-CES293 Robot, Disco DCS1440, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
DCS1440Disco
OEMABMDisco
Category——
Wafer size—100mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyABM -407B-1-S-CES293 RobotDisco DCS1440
Specifications
ModelABM-407B-1-S-CES293[1]—
DescriptionROBOT[1]—
Refurbished RTP RTAAG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1]—
KLA-Tencor Spare Parts and ServiceRS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1]—
Refurbished Isotropic Plasma EtcherMatrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1]—
Refurbished PECVD, ALD EquipmentCambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1]—
Refurbished Mask AlignerCanon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1]—
Refurbished BondingSUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1]—
Refurbished Wafer ProberElectroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1]—
Mentioned function—atomizing cleaning[2]
Associated equipment—DAG810 automatic surface grinder[2]
Maximum workpiece size—Φ8 inch[3]
Application frame—2-8-1[4]
Table RPM—100 to 3,000 min⁻¹[3]
Setting time for cleaning/drying—0 to 999 sec[3]
Cleaning nozzle speed—1 to 37.5 °/sec[3]
Cleaning range—Φ365 mm (up to 250×250 mm)[3]
Cleaning pressure range—2.3 to 11.8 MPa[3]
Equipment dimensions (W×D×H)—400 × 600 × 1,220 mm[3]
Dry mass—Approx. 124 kg[3]
Maximum square workpiece (optional)—250×250 mm[3]
Sources (4)Every fact above is drawn from these public sources
  1. [1]dealer listingsemistarcorp.com
  2. [2]epfl.chepfl.ch
  3. [3]disco.co.jpdisco.co.jp
  4. [4]disco.com.sgdisco.com.sg